X-ray photoelectron spectroscopy
Chemical analysis of surface occupancy (information depth of measurement approx. 10 nm) of thin layers ( <0.5 µm) using a depth profile
| investigation method | X-ray photoelectron spectroscopy |
| abbreviation | XPS |
| Device type and equipment | SSI M-Probe |
| functional principle | Measurement of the element-specific energy of photoelectrons that have been knocked out of the surface of the sample using X-rays. In some cases, different types of bonding can also be distinguished. |
| Typical applications | Chemical analysis of surface occupancy (information depth of measurement approx. 10 nm) of thin layers (< 0.5 µm) by means of depth profile |
| detection limit | |
| Requirements for sample | Measuring area >1 mm²; max. sample size : 20 x 20 x 5 mm |
| Accreditation / Certification | ISO17025 |
Example applications for X-ray photoelectron spectroscopy
XPS for pharmaceutical and chemical
Find out more about our expertise in the field of CRDO
XPS for aluminum surfaces
Surface contamination is the most common cause of defects on anodized surfaces. An XPS analysis can be used to characterize the contaminants.
Find out more about our expertise in the field of aluminum surfaces.
XPS for technical security
Find out more about our expertise in the field of technical security
You can find an overview of other methods in the field of chemical analysis in our encyclopedia – chemical analysis and in the field of materialography and metallography in our encyclopedia – materialography.
